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U₂O₅ Film Hazırlık UO₂ifade doğru akım fışkırtması ve art arda gelen oksidasyon ve Redüksiyon atomik oksijen ve Atomik hidrojen ile üzerinden

JoVE Journal
Química

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JoVE Journal Química

U₂O₅ Film Preparation via UO₂Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

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U₂O₅ Film Hazırlık UO₂ifade doğru akım fışkırtması ve art arda gelen oksidasyon ve Redüksiyon atomik oksijen ve Atomik hidrojen ile üzerinden

7,649 Views

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12:05 min

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February 21, 2019

DOI:

10.3791/59017-v

DOI:

10.3791/59017-v

•

12:05 min

February 21, 2019

•

3 Views

Thomas Gouder, Frank Huber, Rachel Eloirdi, Roberto Caciuffo

¹European Commission, Joint Research Centre,Directorate for Nuclear Safety and Security

Tags

U2O5 UO2 Thin Film Sputtering Oxidation Reduction Atomic Oxygen Atomic Hydrogen Uranium Oxides Surface Composition X-ray Photoelectron Spectroscopy Nitrides Carbides Ultra-high Vacuum Sample Preparation Gold Substrate Loading Chamber Vacuum System

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