/
/
Fabricage van Gate-afstembare Grafeen Inrichtingen voor Scanning Tunneling Microscopy Studies met Coulomb Verontreinigingen
É necessária uma assinatura da JoVE para visualizar este conteúdo. Faça login ou comece sua avaliação gratuita.
Fabricage van Gate-afstembare Grafeen Inrichtingen voor Scanning Tunneling Microscopy Studies met Coulomb Verontreinigingen
15,152 Views
•
11:42 min
•
July 24, 2015
DOI:
1Department of Physics,University of California at Berkeley, 2Department of Chemistry,University of California at Berkeley, 3Department of Chemical and Biomolecular Engineering,University of California at Berkeley, 4National Institute for Materials Science (Japan), 5Materials Sciences Division,Lawrence Berkeley National Laboratory, 6Kavli Energy NanoSciences Institute,University of California at Berkeley and Lawrence Berkeley National Laboratory
Read Article
Cite this Article
Jung, H. S., Tsai, H., Wong, D., Germany, C., Kahn, S., Kim, Y., Aikawa, A. S., Desai, D. K., Rodgers, G. F., Bradley, A. J., Velasco Jr., J., Watanabe, K., Taniguchi, T., Wang, F., Zettl, A., Crommie, M. F. Fabrication of Gate-tunable Graphene Devices for Scanning Tunneling Microscopy Studies with Coulomb Impurities. J. Vis. Exp. (101), e52711, doi:10.3791/52711 (2015).
Copy