このコンテンツを視聴するには、JoVE 購読が必要です。 サインイン又は無料トライアルを申し込む。
Fabricating Nanogaps by Nanoskiving
10,881 Views
•
07:36 min
•
May 13, 2013
DOI:
概要
Automatically generated
The fabrication of electrically addressable, high-aspect-ratio (> 1000:1) metal nanowires separated by gaps of single nanometers using either sacrificial layers of aluminum and silver or self-assembled monolayers as templates is described. These nanogap structures are fabricated without a clean room or any photo- or electron-beam lithographic processes by a form of edge lithography known as nanoskiving.
Read Article
Cite this Article
Pourhossein, P., Chiechi, R. C. Fabricating Nanogaps by Nanoskiving. J. Vis. Exp. (75), e50406, doi:10.3791/50406 (2013).
Copy