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Niobium oxide films afgezet door reactieve sputtering: effect van zuurstof debiet
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Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate
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Niobium oxide films afgezet door reactieve sputtering: effect van zuurstof debiet

7,090 Views

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08:23 min

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September 28, 2019

DOI:

10.3791/59929-v

DOI:
10.3791/59929-v

•

08:23 min
September 28, 2019

•

8 Views
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1Chemistry Department,Federal University of São Carlos (UFSCAR), 2Physics Department, School of Sciences,São Paulo State University (UNESP)

Summary

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Hier presenteren we een protocol voor niobium oxide films afzetting door reactieve sputteren met verschillende zuurstof stroomsnelheden voor gebruik als een elektron transportlaag in perovskietmodule zonnecellen.

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Cite this Article

Fernandes, S. L., Affonço, L. J., Junior, R. A. R., da Silva, J. H. D., Longo, E., Graeff, C. F. d. O. Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate. J. Vis. Exp. (151), e59929, doi:10.3791/59929 (2019).

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