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In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx
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In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx

In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx

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09:49 min

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May 13, 2020

DOI:

10.3791/61026-v

DOI:
10.3791/61026-v

•

09:49 min
May 13, 2020

•

12 Views
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1Functional Materials and Microsystems Research Group and the Micro Nano Research Facility,RMIT University, 2RMIT Microscopy and Microanalysis Facility,RMIT University

Summary

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Presented here is a protocol for analyzing nanostructural changes during in situ biasing with transmission electron microscopy (TEM) for a stacked metal-insulator-metal structure. It has significant applications in resistive switching crossbars for the next generation of programmable logic circuits and neuromimicking hardware, to reveal their underlying operation mechanisms and practical applicability.

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Cite this Article

Nirantar, S., Mayes, E., Sriram, S. In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx. J. Vis. Exp. (159), e61026, doi:10.3791/61026 (2020).

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