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电介质元表面的等强度光束生成演示
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Demonstration of Equal-Intensity Beam Generation by Dielectric Metasurfaces
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电介质元表面的等强度光束生成演示

DOI:
10.3791/59066-v

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09:33 min

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June 07, 2019

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, ,
1Department of Mechanical Engineering,Pohang University of Science and Technology (POSTECH), 2Department of Chemical Engineering,Pohang University of Science and Technology (POSTECH), 3National Institute of Nanomaterials Technology (NINT)

Capítulos

  • 00:04Título
  • 00:52Deposition of Hydrogenated Amorphous Silicon (a-Si:H) on a Fused Silica Substrate by Plasma-enhanced Chemical Vapor Deposition (PECVD)
  • 01:35Formation of the Chromium Etching Mask
  • 06:53Etching Process of Hydrogenated Amorphous Silicon
  • 07:41Results: The Fabricated Metasurface and its Polarization-independent
  • 08:31Conclusion

Summary

Traducción Automática

Traducción Automática

提出了介电元表面的制造和光学表征方案。该方法不仅可用于光束分割器的制造,还可用于一般介电元表面的制造,如透镜、全息图和光学斗篷。

Tags

Metasurface FabricationDielectric MetasurfaceEqual-intensity Beam GenerationPECVDPMMAElectron Beam LithographySilicon Photonics

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