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يمكن عزوها بالذرة البنية النانوية تلفيق
JoVE Revista
Ingeniería
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JoVE Revista Ingeniería
Atomically Traceable Nanostructure Fabrication
DOI:

12:35 min

July 17, 2015

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Capítulos

  • 00:05Título
  • 02:15Scanning Tunneling Microscopy and Lithography
  • 05:42Atomic Layer Deposition
  • 06:37Atomic Force Microscopy and Reactive Ion Etching
  • 08:47Scanning Electron Microscopy
  • 09:58Results: Surface Patterning with Selective Atomic Layer Deposition and Reactive Ion Etching
  • 11:39Conclusion

Summary

Traducción Automática

We report a protocol for combining the atomic metrology of the Scanning Tunneling Microscope for surface patterning with selective Atomic Layer Deposition and Reactive Ion Etching. Using a robust process involving numerous atmospheric exposures and transport, 3D nanostructures with atomic metrology are fabricated.

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