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硅表面润湿性的选择区域改性脉冲紫外激光照射在液体环境
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JoVE Journal Ingenieurwesen
Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment
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硅表面润湿性的选择区域改性脉冲紫外激光照射在液体环境

8,110 Views

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08:48 min

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November 09, 2015

DOI:

10.3791/52720-v

DOI:
10.3791/52720-v

•

08:48 min
November 09, 2015

•

4 Views
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1Laboratory for Quantum Semiconductors and Photon-based BioNanotechnology, Interdisciplinary Institute for Technological Innovation, Laboratoire Nanotechnologies Nanosystèmes (LN2)- CNRS UMI-3463, Faculty of Engineering,Université de Sherbrooke

Tags

Silicon Surface WettabilityPulsed UV Laser IrradiationLiquid EnvironmentSuperhydrophilicHydrophobicSurface FunctionalizationBiosensingOH-terminated SiSi-OCH3 Compounds

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Liu, N., Moumanis, K., Dubowski, J. J. Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment. J. Vis. Exp. (105), e52720, doi:10.3791/52720 (2015).

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