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Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment
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Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment

Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment

8,126 Views

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08:48 min

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November 09, 2015

DOI:

10.3791/52720-v

DOI:
10.3791/52720-v

•

08:48 min
November 09, 2015

•

1 Views
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1Laboratory for Quantum Semiconductors and Photon-based BioNanotechnology, Interdisciplinary Institute for Technological Innovation, Laboratoire Nanotechnologies Nanosystèmes (LN2)- CNRS UMI-3463, Faculty of Engineering,Université de Sherbrooke

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We report on a process of in situ alteration of HF treated Si (001) surface into a hydrophilic or hydrophobic state by irradiating samples in microfluidic chambers filled with H2O2/H2O solution (0.01%-0.5%) or methanol solutions using pulsed UV laser of a relative low pulse fluence.

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Cite this Article

Liu, N., Moumanis, K., Dubowski, J. J. Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment. J. Vis. Exp. (105), e52720, doi:10.3791/52720 (2015).

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