Journal
/
Ingenieurwesen
/
Fabrication of Spatially Confined Complex Oxides
JoVE Journal
Ingenieurwesen
Zum Anzeigen dieser Inhalte ist ein JoVE-Abonnement erforderlich.  Melden Sie sich an oder starten Sie Ihre kostenlose Testversion.
JoVE Journal Ingenieurwesen
Fabrication of Spatially Confined Complex Oxides

Fabrication of Spatially Confined Complex Oxides

9,339 Views

•

08:45 min

•

July 01, 2013

DOI:

10.3791/50573-v

DOI:
10.3791/50573-v

•

08:45 min
July 01, 2013

•

1 Views
,
1Materials Science and Technology Division,Oak Ridge National Laboratory, 2Department of Physics & Astronomy,University of Tennessee, Knoxville

Summary

Automatically generated

We describe the use of pulsed laser deposition (PLD), photolithography and wire-bonding techniques to create micrometer scale complex oxides devices. The PLD is utilized to grow epitaxial thin films. Photolithography and wire-bonding techniques are introduced to create practical devices for measurement purposes.

Explore More Videos

Complex OxidesHigh Tc SuperconductorsMultiferroicsColossal MagnetoresistorsElectronic Phase SeparationThin Film GrowthPhotolithographyWire-bondingMicrostructuresManganite Devices

Read Article

Cite this Article

Guo, H., Ward, T. Z. Fabrication of Spatially Confined Complex Oxides. J. Vis. Exp. (77), e50573, doi:10.3791/50573 (2013).

Download .ris file

Copy

Share Video

.

Copy