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Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate
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Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate

Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate

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08:23 min

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September 28, 2019

DOI:

10.3791/59929-v

DOI:
10.3791/59929-v

•

08:23 min
September 28, 2019

•

2 Views
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1Chemistry Department,Federal University of São Carlos (UFSCAR), 2Physics Department, School of Sciences,São Paulo State University (UNESP)

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Fernandes, S. L., Affonço, L. J., Junior, R. A. R., da Silva, J. H. D., Longo, E., Graeff, C. F. d. O. Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate. J. Vis. Exp. (151), e59929, doi:10.3791/59929 (2019).

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