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Accumulation and Analysis of Cuprous Ions in a Copper Sulfate Plating Solution

JoVE 杂志
化学

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JoVE 杂志化学

Accumulation and Analysis of Cuprous Ions in a Copper Sulfate Plating Solution

Accumulation and Analysis of Cuprous Ions in a Copper Sulfate Plating Solution

14,322 Views

•

07:00 min

•

March 20, 2019

DOI:

10.3791/59376-v

DOI:

10.3791/59376-v

•

07:00 min

March 20, 2019

•

9 Views

Toshiaki Koga, Yoshitaro Sakata, Nao Terasaki

¹Advanced Manufacturing Research Institute, Department of Electronics and Manufacturing,National Institute of Advanced Industrial Science and Technology (AIST)

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