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UO2 증 착 직류 스퍼터 링 및 연속 산화와 산소 원자와 원자 수소 감소를 통해 U2O5 영화 준비
JoVE 杂志
化学
This content is Free Access.
JoVE 杂志 化学
U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
DOI:

12:05 min

February 21, 2019

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Chapters

  • 00:04Title
  • 01:06The Labstation Modular Machine
  • 02:11Introduction of the Sample and Sample Holder into the Labstation
  • 03:10Transfer the Sample Holder to the Preparation Chamber
  • 04:03In situ Cleaning of the Sample Holder and Sample Holder Characterization
  • 05:39Deposition of a UO2 Thin Film
  • 06:50UO2 Sample Characterization
  • 07:38Oxidation of UO2 with Atomic Oxygen and Analysis of the UO3 Obtained
  • 08:52Reduction of UO3 by Atomic Hydrogen and Analysis of the U2O5 Obtained
  • 09:45Results: Identification of Uranium(V) in Thin Films
  • 10:51Conclusion

Summary

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이 프로토콜 초고 진공에서 U2O5 박막 얻은 현장에 준비를 제공합니다. 과정 각각 산화와 산소 원자와 원자 수소, UO2 영화의 감소를 포함.

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