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Epitaxial Growth of Perovskite Strontium Titanate on Germanium via Atomic Layer Deposition
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JoVE 杂志 化学
Epitaxial Growth of Perovskite Strontium Titanate on Germanium via Atomic Layer Deposition

Epitaxial Growth of Perovskite Strontium Titanate on Germanium via Atomic Layer Deposition

DOI:
10.3791/54268-v

•

09:45 min

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July 26, 2016

•

, , ,
1McKetta Department of Chemical Engineering,The University of Texas at Austin

Chapters

  • 00:05Title
  • 01:20Cleaning the Germanium Substrate
  • 02:46Loading to the Vacuum System and Germanium Deoxidization
  • 04:30Thin Film ALD Growth and Annealing of the Strontium Titanate (STO) Film
  • 07:23Results: RHEED and X-ray Diffraction Analysis
  • 08:41Conclusion

Summary

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This work details the procedures for the growth and characterization of crystalline SrTiO3 directly on germanium substrates by atomic layer deposition. The procedure illustrates the ability of an all-chemical growth method to integrate oxides monolithically onto semiconductors for metal-oxide semiconductor devices.

Tags

Keywords: Epitaxial GrowthPerovskiteStrontium TitanateGermaniumAtomic Layer DepositionMicroelectronicsDielectricCrystalline OxidesInterface StatesManufacturingPrecursorsMolecular Beam EpitaxySubstrate CleaningUV Ozone CleaningVacuum System

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