É necessária uma assinatura da JoVE para visualizar este conteúdo. Faça login ou comece sua avaliação gratuita.
紫外発光ダイオード用ナノパターンサファイア基板上のAlNフィルムのグラフェン支援準ファンデルワールスエピタキシー
6,998 Views
•
07:00 min
•
June 25, 2020
DOI:
1State Key Laboratory of Solid-State Lighting, Institute of Semiconductors,Chinese Academy of Sciences, 2Center of Materials Science and Optoelectronics Engineering,University of Chinese Academy of Science, 3Center for Nanochemistry (CNC), Beijing National Laboratory for Molecular Science, College of Chemistry and Molecular Engineering,Peking University, 4State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors,Chinese Academy of Sciences, 5Electron Microscopy Laboratory, School of Physics,Peking University
Summary
Automatically generated
ナノパターンサファイア基板上の高品質AlNフィルムのグラフェン支援成長のためのプロトコルが提示される。
Read Article
Cite this Article
Zhang, X., Chen, Z., Chang, H., Yan, J., Yang, S., Wang, J., Gao, P., Wei, T. Graphene-Assisted Quasi-van der Waals Epitaxy of AlN Film on Nano-Patterned Sapphire Substrate for Ultraviolet Light Emitting Diodes. J. Vis. Exp. (160), e60167, doi:10.3791/60167 (2020).
Copy