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Accumulation and Analysis of Cuprous Ions in a Copper Sulfate Plating Solution
JoVE Journal
Química
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JoVE Journal Química
Accumulation and Analysis of Cuprous Ions in a Copper Sulfate Plating Solution

Accumulation and Analysis of Cuprous Ions in a Copper Sulfate Plating Solution

DOI:
10.3791/59376-v

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07:00 min

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March 20, 2019

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, ,
1Advanced Manufacturing Research Institute, Department of Electronics and Manufacturing,National Institute of Advanced Industrial Science and Technology (AIST)

Capítulos

  • 00:04Título
  • 01:00Formation of the Cu(I) in The Plating Solution
  • 02:48Quantitative Measurement of the Cu(I)
  • 03:46Injection Measurement of Cu(I) and BCS Color Reaction Curves
  • 04:46Results: Analysis of the Cuprous Ions from the Copper Sulfate Plating Solution
  • 06:17Conclusion

Summary

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Here, accumulation of cuprous ions in a copper sulfate plating solution in a model experiment and an analysis based on quantitative measurements are described. This experiment reproduces the accumulation process of cuprous ions in the plating bath.

Tags

Keywords: Copper SulfatePlating SolutionMonovalent CopperQuantificationOptical EvaluationNitrogen GasCopper PlatePlatinum PlatePower SupplyUV-Vis Spectrophotometer

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