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利用uo2沉积制备 u2o5 薄膜, 利用原子氧和原子氢连续氧化还原
JoVE Journal
Química
This content is Free Access.
JoVE Journal Química
U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
DOI:

12:05 min

February 21, 2019

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Capítulos

  • 00:04Título
  • 01:06The Labstation Modular Machine
  • 02:11Introduction of the Sample and Sample Holder into the Labstation
  • 03:10Transfer the Sample Holder to the Preparation Chamber
  • 04:03In situ Cleaning of the Sample Holder and Sample Holder Characterization
  • 05:39Deposition of a UO2 Thin Film
  • 06:50UO2 Sample Characterization
  • 07:38Oxidation of UO2 with Atomic Oxygen and Analysis of the UO3 Obtained
  • 08:52Reduction of UO3 by Atomic Hydrogen and Analysis of the U2O5 Obtained
  • 09:45Results: Identification of Uranium(V) in Thin Films
  • 10:51Conclusion

Summary

Tadução automática

该协议介绍了在超高真空下原位获得的 u2o5 薄膜的制备方法.该过程涉及用原子氧和氢原子氧化和还原 uo2 薄膜。

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