制备纳米设计的脉冲激光沉积透明导电氧化物
Summary
我们描述了实验的背景气体的存在下，在纳秒的脉冲激光沉积（PLD）方法来沉积纳米结构的氧化物薄膜。通过使用此方法的掺Al的ZnO（AZO）膜，从紧凑型分层结构为纳米树森林，可以沉积。
Abstract
纳秒的脉冲激光沉积（PLD）中的背景气体的存在下，使金属氧化物的沉积，与可调的形态，结构，密度和化学计量由一个适当的控制的等离子羽状物的膨胀动力学。这种通用性可以被利用来产生纳米薄膜从紧凑的和致密的纳米多孔其特征在于由一个分层组件的纳米尺寸的簇。特别是，我们描述了详细的方法，制备两种类型的掺Al的ZnO（AZO）膜，作为透明电极在光生伏打器件中：1）在低O 2压力，紧凑的薄膜的导电性和光学透明性本领域的状态接近透明导电氧化物（TCO），可以沉积在室温下，与热敏感材料，如用的聚合物在有机光伏（OPVs）; 2）高的光散射的层次结构类似于森林纳米树兼容产品在更高压力uced。这种结构显示出高的雾度因子（> 80％），并且可能被利用，提高光俘获能力。 AZO薄膜为这里所描述的方法可以适用于其他金属氧化物有关的技术的应用，例如WO 3中的Al 2 O 3，TiO 2的 ，和Ag 4 O 4。
Introduction
脉冲激光沉积（PLD）采用这导致在可沉积在衬底上生长的膜（参见图1）1的等离子体烧蚀物种形成在固体靶的激光烧蚀。带有背景气氛（惰性或反应性）的相互作用，可以用于诱导在气相中（参见图2）2,3均相群集成核。我们的策略的材料合成PLD的基础上调整材料的性能在一个自底向上的方法，通过仔细控制的PLD过程中产生的等离子体动力学。簇的大小，动能和组合物可以是多种多样的沉积参数影响膜的成长，并导致在形态和结构的变化4,5由一个适当的设置。这里描述的方法通过利用我们表明，一些氧化物（ 例如，WO 3银4 O 4，Al 2 O 3届TiO 2的 ）的能力来调整形态，密度，孔隙率，通过修改的材料在纳米级的结构6-11度的结构顺序，化学计量和相位。这允许为特定应用程序12-16的材料的设计。随着光伏应用，我们合成了纳米二氧化钛分层组织通过组装纳米颗粒（<10 nm）的纳米和介孔结构，类似于一个“森林树木13时在染料敏化太阳能电池的光阳极有趣的结果（DSSC ）17。这些先前的结果的基础上，我们描述用于沉积的掺Al的ZnO（AZO）膜，作为透明导电氧化物的协议。
透明导电氧化物（干事）是高的带隙（> 3 eV）的转换成由重掺杂的导体材料，显示电阻率<10 -3欧姆-厘米和80％以上的光学transmittance在可见光范围内。它们是许多应用中的一个关键因素，如触摸屏，太阳能电池18-21，它们通常是由不同的技术，例如溅射，脉冲激光沉积法，化学气相沉积，喷雾热解和解决方案为基础的化学方法生长。其中干事，铟 – 锡 – 氧化物（ITO）已被广泛的研究，它的低电阻率，但患有成本高的缺点和低可用性的铟。 F掺杂的SnO 2（FTO），掺Al的ZnO（AZO）和F-掺杂的氧化锌（FZO），例如铟-自由系统研究现在走向。
能够提供智能化管理的入射光（灯光诱捕）的电极是特别有趣的光伏发电应用。要利用散射调制的规模结构和形貌与光的波长（ 例如：300-1000 nm）的，很好的控制在可见光通过的可能性膜的形态和在群集组件架构是必要的。
特别是，我们将介绍如何调整的AZO膜的形貌和结构。紧凑型AZO沉积在低压力（2帕氧），并在室温下，而其特征在于低电阻率（4.5×10 -4欧姆-厘米）和可见光透明度（> 90％），它是具有竞争力AZO沉积在高温下AZO层次结构是通过消融O 2大于100帕的压力，这些结构显示出强烈的光散射能力，雾度高达80％以上22,23。
Protocol
Representative Results
Discussion
的等离子羽状物的形状是消融过程密切相关，特别是在气体的存在下;监测等离子体羽流通过视觉检查是重要的控制沉积。当沉积金属氧化物，消融的氧化物靶，氧是必要的，以支持在消融过程中的氧损失。在较低的氧背景气体的压力，所沉积的材料可以具有氧空位。这种效果是通过增加的气体压力降低。为了分离从形态学的气体混合物（ 即氩：O 2或He：O 2）的化学计量比?…
Disclosures
The authors have nothing to disclose.
Materials
| Name of Reagent/Material | Company | Catalog Number |
| Pulsed Laser | Continuum-Quantronix | Powerlite 8010 |
| Power meter | Coherent | FieldMaxII-TO |
| Ion Gun | Mantis Dep | RFMax60 |
| Mass flow controller | Mks | 2179 ° |
| Quartz Crystal Microbalance | Infcon | XTC/2 |
| Background gas | Rivoira-Praxair | 5.0 oxygen |
| Target | Kurt Lesker | (made on request) |
| Isopropanol | Sigma Aldrich | 190764-2L |
| Source meter | Keithley | K2400 |
| Magnet Kit | Ecopia | 0.55T-Kit |
| Spectrophotometer | PerkinElmer | Lambda 1050 |
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