In this paper we describe the interfacial synthesis of conjugated microporous polymers (CMP) on sacrificial substrates, and the dissolution of the substrate for the preparation of freestanding CMP nanomembranes. In addition, we will describe how the fragile nanomembranes can be transferred to other substrates.
CMP as large surface area materials have attracted growing interest recently, due to their high variability in the incorporation of functional groups in combination with their outstanding thermal and chemical stability, and low densities. However, their insoluble nature causes problems in their processing since usually applied techniques such as spin coating are not available. Especially for membrane applications, where the processing of CMP as thin films is desirable, the processing problems have hindered their commercial application.
Here we describe the interfacial synthesis of CMP thin films on functionalized substrates via molecular layer-by-layer (l-b-l) synthesis. This process allows the preparation of films with desired thickness and composition and even desired composition gradients.
The use of sacrificial supports allows the preparation of freestanding membranes by dissolution of the support after the synthesis. To handle such ultra-thin freestanding membranes the protection with sacrificial coatings showed great promise, to avoid rupture of the nanomembranes. To transfer the nanomembranes to the desired substrate, the coated membranes are upfloated at the air-liquid interface and then transferred via dip coating.
The preparation of ultra-thin polymer membranes is of high interest for applications in gas separation and nanofiltration. Challenges in the synthesis are represented by (a) the control of the membrane thickness and the homogeneity and (b) transfer of such fragile membranes. To overcome challenge (a), molecular layer-by-layer synthesis1 has shown great promise in controlling the thickness and homogeneity of thin films grown at the solid-liquid interface.2,3 Controlling the number of layers linearly controls the film thickness. The l-b-l method has been successfully used to fabricate surface mounted metal organic frameworks (SURMOFs),4-7 also the synthesis of thin polymer films via l-b-l reaction of polymer chains was demonstrated.8 The challenge (b) concerns the handling of these ultra-thin membranes. To avoid rupture or wrinkling of the nanomembranes sacrificial supports of coatings have shown great promise. 9
Here we will present a detailed protocol for synthesis of conjugated microporous polymer (CMP)10-13 thin films through sequential addition of the molecular building blocks, with desired thickness and composition. The preparation of free-standing CMP nanomembranes is achieved by using a sacrificial support. To handle and transfer the CMP nanomembranes to other supports we will describe a simple protocol to protect the membranes with sacrificial coatings and their upfloating to the liquid air interface and subsequent transfer using dip-coating.
1. Synthesis of CMP Thin Films through Sequential Addition
2. Transfer of CMP Nanomembranes
The membranes are characterized by infrared reflection absorption spectroscopy (IRRAS).16 Figure 4 shows IRRA-spectra from a CMP-membrane transferred to a gold wafer. Typical bands from the vibrations of the aromatic backbone are at 1,605 cm-1, 1,515 cm-1 and 1,412 cm-1. Unreacted alkyne and azide groups can be observed by characteristic bands at 2,125 cm-1 and 1,227 cm-1. Figure 5 shows a scanning electron microscopy (SEM) image. The freestanding membrane is clearly visible.
Figure 1. Molecular building blocks. Molecular structures of (A) TPM-alkyne and (B) TPM-azide. Please click here to view a larger version of this figure.
Figure 2. Reaction apparatus. Set up for the layer-by-layer synthesis of the CMP thin-films. The apparatus consists of a one neck round bottom flask as reservoir for the THF, the steam tube to lead the THF vapor to the reflux cooler. The THF condensates are collected in the sample compartment. The chemicals can be inserted over the screw cap with a septum. The sample compartment is emptied via the bottom outlet. Please click here to view a larger version of this figure.
Figure 3. Removing mica. The PMMA/CMP membrane is starting to detach from the edge of the mica-substrate. Half of the PMMA/CMP is floating on top of the water, the other half is still attached to the mica substrate. Please click here to view a larger version of this figure.
Figure 4. IRRA-spectra. IRRA-spectra from a CMP-membrane transferred to a gold-wafer. The bands from the vibrations of the aromatic backbone at 1,605, 1,515 and 1,412 cm-1 are characteristic for the CMP-membrane. The CD vibration is due to the background used. Please click here to view a larger version of this figure.
Figure 5. SEM-image. SEM-Image of the CMP-membrane. The freestanding membrane is nicely shown. (Reprinted with permission from Lindemann, P. et al. Chem. Mater. 26, 7189 – 7193. Copyright 2014 American Chemical Society.) Please click here to view a larger version of this figure.
For the synthesis of the CMP-film the solution of the catalyst has to be fresh. A broken catalyst (i.e., oxidized) is indicated by a blue coloration of the solution. The fresh solution is colorless.
A crucial point is to cut the edges of the mica substrate after spin coating PMMA. Also defects in the substrate should be cut, i.e., each spot were the PMMA can come in contact with the mica substrate, because of a missing gold layer. Otherwise the gold layer cannot be stripped off from the mica substrate easily. Also concerning the detachment of the gold layer from the mica substrate, after the detachment started on one edge or corner, one should continue on this edge till the gold layer is completely detached.
During the transfer of the PMMA/CMP membranes with a silicon wafer, e.g., from the water bath to the iodine solution or from the iodine solution to water, it is important that the membrane doesn’t dry. Once the membrane dries on the Si-wafer, it is almost impossible to detach it again.
After dissolving the PMMA, each rinsing step should be performed cautiously; an overlapped edge from the membrane can lead to a removing of the membrane from the substrate.
At the moment the size of the samples is limited by the size of the sample compartment. The thickness of the fabricated CMP films is limited by the reaction time because each cycle needs around 2 hr. For a less labor intensive synthesis the reaction apparatus could be modified by adding a syphon; as a result the sample compartment will be emptied automatically, comparable to a Soxhlet extractor.
Our technique combines the processing of ultrathin conjugated microporous polymer films and the use of a sacrificial substrate to obtain CMP nanomembranes. The synthesis of CMP nanomembranes was yet not possible because of the low processability of powder CMP.
In comparison to other techniques, for example the production of SURMOFs7, we achieved a reduction on the amount of solvent used. Especially the rinsing step in case of SURMOF production has a high consumption of solvent, in this case, due to the use of refluxing THF, we could decrease the consumption of THF drastically.
We expect that the presented method will find application in gas and liquid phase separation because of the possibilities to fine-tune the selectivity and permeance by the control over pore size and chemical affinity. In addition, modular synthesis of CMP materials from functional building blocks suitable for other applications, such as catalysis, sensing, or organic electronics, could also benefit from the described processing method.
The authors have nothing to disclose.
The authors have no acknowledgements.
Acetone | VWR BDH Prolabo | 20066.330 | AnalR NORMAPUR |
Potassium iodide | VWR BDH Prolabo | 26846.292 | AnalR NORMAPUR |
Ethyl acetate | VWR BDH Prolabo | 23882.321 | AnalR NORMAPUR |
Tetrahydrofurane (THF) | VWR BDH Prolabo | 28559.320 | HiPerSolv CHROMANORM |
THF waterfree | Merck Millipore | 1.08107.1001 | SeccoSolv |
Iodine | Sigma-Aldrich | 20,777-2 | |
Tetrakis(acetonitrile)copper(I)hexafluoro-phosphate | Sigma-Aldrich | 346276-5G | |
Poly(methyl methacrylate) 996 kDa (PMMA) | Sigma-Aldrich | 182265-25G | |
1.1.1.1 Methanetetrayltetrakis(4-azidobenzene) (TPM-azide) | provided by AK Prof. Bräse. Institute of organic chemistry, Karlsruhe Institute of Technology. Synthesized according to9 | ||
1.1.1.1 Methanetetrayltetrakis(4-ethinylenebenzene) (TPM-alkyne) | provided by AK Prof. Bräse. Institute of organic chemistry, Karlsruhe Institute of Technology. Synthesized according to9 | ||
11-thioacetyl-undecaneacid propargylamide | provided by AK Prof. Bräse. Institute of organic chemistry, Karlsruhe Institute of Technology. Synthesized according to8 | ||
gold/titan coated silicium-wafer | Georg Albert PVD, 76857 Silz, Germany | ||
gold coated mica | Georg Albert PVD, 76857 Silz, Germany |