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Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate
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JoVE Journal Chemie
Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate

Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate

DOI:
10.3791/59929-v

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08:23 min

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September 28, 2019

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, , , , ,
1Chemistry Department,Federal University of São Carlos (UFSCAR), 2Physics Department, School of Sciences,São Paulo State University (UNESP)

Kapitel

  • 00:04Titel
  • 00:47Niobium Oxide Film Deposition
  • 03:55Solar Cell Construction
  • 05:46Results: The Effects of Oxygen Flow Rates on Reactive Sputtering
  • 07:23Conclusion

Summary

Automatische Übersetzung

Automatische Übersetzung

Here, we present a protocol for niobium oxide films deposition by reactive sputtering with different oxygen flow rates for use as an electron transport layer in perovskite solar cells.

Tags

Reactive SputteringNiobium Oxide FilmsOxygen Flow RateThin Film DepositionSubstrate PreparationSputtering Process ParametersFilm ThicknessPlasma CleaningImpedance Matching

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