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Kapitel
- 00:05Titel
- 01:46Preparation for Dissolution Locking and Thermal Evaporation of Photochromic Molecules
- 04:20Exposures
- 05:35Sample Development for Dissolution Locking
- 06:24Results: Samples Fabricated Using Patterning via Optical Saturable Transitions (POST)
- 07:56Conclusion
We report that the diffraction limit of conventional optical lithography can be overcome by exploiting the transitions of organic photochromic derivatives induced by their photoisomerization at low light intensities.1-3 This paper outlines our fabrication technique and two locking mechanisms, namely: dissolution of one photoisomer and electrochemical oxidation.
