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U2O5膜を介して直流スパッタリングと連続酸化による UO2成膜と酸素原子と水素原子の還元
JoVE 杂志
化学
This content is Free Access.
JoVE 杂志 化学
U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
DOI:

12:05 min

February 21, 2019

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Chapters

  • 00:04Title
  • 01:06The Labstation Modular Machine
  • 02:11Introduction of the Sample and Sample Holder into the Labstation
  • 03:10Transfer the Sample Holder to the Preparation Chamber
  • 04:03In situ Cleaning of the Sample Holder and Sample Holder Characterization
  • 05:39Deposition of a UO2 Thin Film
  • 06:50UO2 Sample Characterization
  • 07:38Oxidation of UO2 with Atomic Oxygen and Analysis of the UO3 Obtained
  • 08:52Reduction of UO3 by Atomic Hydrogen and Analysis of the U2O5 Obtained
  • 09:45Results: Identification of Uranium(V) in Thin Films
  • 10:51Conclusion

Summary

自动翻译

このプロトコルは、超高真空下で U2O5得られた薄膜の場で準備を提示します。プロセスは、それぞれ酸化と UO2膜の酸素原子と水素原子の還元を行います。

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